Realization of Non‐Equilibrium Wurtzite Structure in Heterovalent Ternary MgSiN2 Film Grown by Reactive Sputtering
The piezoelectric and ferroelectric applications of heterovalent ternary materials are not well explored. Epitaxial MgSiN2 films are grown at 600 °C on (111)Pt//(001)Al2O3 substrates by the reactive sputtering method using metallic Mg and Si under the N2 atmosphere. Detailed X-ray diffraction measurements and transmission electron microscopy observations revealed that the epitaxially grown films on the substrates have a hexagonal wurtzite structure with c-axis out-of-plane orientation. The random occupation of this structure by Mg and Si differs from that of the previously reported structure in which these two cations periodically occupy the cationic sites. However, the lattice spacings closely approximate thosemore »